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<OAI-PMH schemaLocation=http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd> <responseDate>2018-01-15T18:38:18Z</responseDate> <request identifier=oai:HAL:hal-00756133v1 verb=GetRecord metadataPrefix=oai_dc>http://api.archives-ouvertes.fr/oai/hal/</request> <GetRecord> <record> <header> <identifier>oai:HAL:hal-00756133v1</identifier> <datestamp>2018-01-11</datestamp> <setSpec>type:ART</setSpec> <setSpec>subject:phys</setSpec> <setSpec>subject:spi</setSpec> <setSpec>collection:CNRS</setSpec> <setSpec>collection:UNIV-AG</setSpec> <setSpec>collection:UNIV-BPCLERMONT</setSpec> <setSpec>collection:ICC</setSpec> <setSpec>collection:PRES_CLERMONT</setSpec> <setSpec>collection:ACL-SF</setSpec> <setSpec>collection:ACL-SPI</setSpec> <setSpec>collection:SIGMA-CLERMONT</setSpec> </header> <metadata><dc> <publisher>HAL CCSD</publisher> <title lang=en>Tribological properties of low-temperature graphite fluorides. Influence of the structure on the lubricating performances</title> <creator>Thomas, Philippe</creator> <creator>Delbé, Karl</creator> <creator>Himmel, David</creator> <creator>Mansot, Jean-Louis</creator> <creator>Cadoré, Franck</creator> <creator>Guérin, Katia</creator> <creator>Dubois, Marc</creator> <creator>Delabarre, Céline</creator> <creator>Hamwi, André</creator> <contributor>Groupe de Technologie des Surfaces et Interfaces (GTSI) ; Université des Antilles et de la Guyane (UAG) - Université des Antilles (Pôle Guadeloupe) ; Université des Antilles (UA) - Université des Antilles (UA)</contributor> <contributor>Laboratoire des Matériaux Inorganiques (LMI) ; Université Blaise Pascal - Clermont-Ferrand 2 (UBP) - Clermont Université - Sigma CLERMONT (Sigma CLERMONT) - Centre National de la Recherche Scientifique (CNRS)</contributor> <description>International audience</description> <source>ISSN: 0022-3697</source> <source>Journal of Physics and Chemistry of Solids</source> <publisher>Elsevier</publisher> <identifier>hal-00756133</identifier> <identifier>https://hal.archives-ouvertes.fr/hal-00756133</identifier> <identifier>https://hal.archives-ouvertes.fr/hal-00756133/document</identifier> <identifier>https://hal.archives-ouvertes.fr/hal-00756133/file/Delbe_6346.pdf</identifier> <source>https://hal.archives-ouvertes.fr/hal-00756133</source> <source>Journal of Physics and Chemistry of Solids, Elsevier, 2006, vol. 67, pp. 1095-1099. 〈10.1016/j.jpcs.2006.01.084〉</source> <identifier>DOI : 10.1016/j.jpcs.2006.01.084</identifier> <relation>info:eu-repo/semantics/altIdentifier/doi/10.1016/j.jpcs.2006.01.084</relation> <identifier>OATAO : 6346</identifier> <language>en</language> <subject lang=ro>Raman spectroscopy</subject> <subject>[PHYS.MECA.MEMA] Physics [physics]/Mechanics [physics]/Mechanics of materials [physics.class-ph]</subject> <subject>[SPI.MECA.MEMA] Engineering Sciences [physics]/Mechanics [physics.med-ph]/Mechanics of materials [physics.class-ph]</subject> <type>info:eu-repo/semantics/article</type> <type>Journal articles</type> <description lang=en>The present work is concerned with the study of the tribological properties of various fluorinated carbon phases obtained at room temperature and then post-treated under fluorine atmosphere at different temperatures. The tribological tests evidence good intrinsic properties for all the compounds (friction coefficient in the range 0.07-0.09). Differences appear after few cycles. Friction measurements after 100 cycles and complementary Raman analyses of the tribofilm remaining in the wear scar point out that long term tribologic properties of the fluorinated compounds strongly depend on the evolution undergone by the materials under friction. The release of HF molecules, the loss of fluorine and partial rebuilding of graphitic phases are at the origin of the degradation of the friction properties. The good properties of the compounds post-treated at temperature in the range 150-300 °C are attributed to the chemical and structural stability of these compounds under friction.</description> <date>2006-05</date> </dc> </metadata> </record> </GetRecord> </OAI-PMH>