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<title lang=en>Influence of tin ion implantation on the damage and annealing kinetics of sapphire</title>
<creator>McHargue, Carl</creator>
<creator>Romana, Laurence</creator>
<contributor>Groupe de Technologie des Surfaces et Interfaces (GTSI) ; Université des Antilles et de la Guyane (UAG) - Université des Antilles (Pôle Guadeloupe) ; Université des Antilles (UA) - Université des Antilles (UA)</contributor>
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<source>ISSN: 0168-583X</source>
<source>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</source>
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<identifier>hal-01685790</identifier>
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<source>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 2000, 166-167, pp.193 - 197. 〈10.1016/S0168-583X(99)00654-0〉</source>
<identifier>DOI : 10.1016/S0168-583X(99)00654-0</identifier>
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<date>2000-05</date>
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